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NanoImprint Technology
Method Development, Methodology Implementation and
High-resolution 3D Templates
Method Development, Methodology Implementation and
High-resolution 3D Templates
The NanoImprint technology which was developed by the NanoImprint Consortium Hessen provides important advantages:
- precision in the sub nanometer range,
- fabrication of 3D-nanostructures even on large areas,
- potential of providing relatively quick and low cost fabrication,
- capabilities at high output rates,
- and hence addresses the mass market.
Find more detailed information about this amazing technology:
New 3D-NanoImprint Template
Conventional NanoImprint Template


